
Symbios Technologies is a world-leading developer of aqueous plasma technology platforms for water treatment and recycling using only air, water, and electricity. The privately held company was founded in 2008 and is headquartered in Fort Collins, Colorado. Initial technology development and vetting was performed at the University of Wisconsin, Colorado State University, and the U.S. Naval Research Laboratory. The Symbios Tubular Plasma Reactor™ (TPR™) was developed by Symbios under Phase I and II-IIB Small Business Innovation Research (SBIR) and other grant support from the U.S. National Science Foundation (NSF), U.S. Department of Energy (DOE), and U.S. National Institutes of Health (NIH), and additional nondilutive funding including strategic funding from a Fortune 50 food and beverage company, energy industry customers, pharmaceutical companies, and others along with prior funding from the Colorado Department of Agriculture, Colorado Governor’s Energy Office, and ag energy companies, totaling $5 million.
Symbios Technologies is commercializing its disruptive advanced low-cost, low-wattage volumetric aqueous plasma technology, the Symbios Tubular Plasma Reactor™ (TPR™), to protect human health, preserve the environment, and clean water as well as improve manufacturing, agriculture, food processing, and energy production economics and sustainability and improve smart nutrient and water outcomes.
The Symbios TPR4000 has applicability as an efficient and cost-effective water treatment technology to aggressively destroy organics and disinfect biologicals for many applications related to purification, sanitation, and clean-in-place. Such applications include food & beverage processing, pharmaceutical manufacturing, hydraulic fracturing flowback & produced water treatment for oil & gas wastewater recycling, landfill leachate recycling, power plant cooling tower water treatment, industrial & municipal wastewater treatment, and other specialty treatment of waters from industrial operations for recycling, reuse, and/or discharge.
